Initial elementary processes in tetrafluoroethylene plasma: Anabinitiomolecular orbital study
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.355116
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4. Anomalous decomposition profile of the excited triplet SiH3F: A prediction by ab initio molecular orbital calculations
5. Anomalously low-lying lowest excited triplet state of SiH2FCHCH2: an ab initio molecular orbital study
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1. Optical emission spectroscopy of pulsed hexalfuoropropylene oxide and tetrafluoroethylene plasmas;Journal of Applied Physics;2002
2. Structures of the main precursors and initial decomposition products of diborane chemical vapor deposition: an experimental and ab initio molecular orbital study;Chemical Physics Letters;2000-07
3. Mechanism of C4F8 dissociation in parallel-plate-type plasma;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-09
4. Elimination of post-release adhesion in microstructures using conformal fluorocarbon coatings;Journal of Microelectromechanical Systems;1997-03
5. Highly cross-linked polymer networks of amorphous silicon alloys: Quantum chemical studies on plasma and photochemical processes;Progress in Polymer Science;1996
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