Control of vinylsilane plasma by changing the pressure: Correspondence with a quantum chemical prediction
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.350755
Reference20 articles.
1. Excited states and photochemistry of saturated molecules. VII. Potential energy surfaces in excited singlet states of methane
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3. Anomalous decomposition profile of the excited triplet SiH3F: A prediction by ab initio molecular orbital calculations
4. On the primary process in plasma-chemical and photochemical vapor deposition from silane: An ab initio study of unimolecular decomposition of SiH4 in the lowest triplet state
5. Measurement of the SiH3Radical Density in Silane Plasma using Infrared Diode Laser Absorption Spectroscopy
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1. Structures of the main precursors and initial decomposition products of diborane chemical vapor deposition: an experimental and ab initio molecular orbital study;Chemical Physics Letters;2000-07
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5. Initial elementary processes in tetrafluoroethylene plasma: Anabinitiomolecular orbital study;Journal of Applied Physics;1993-12
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