On the primary process in the plasma‐chemical and photochemical vapor deposition from silane. Mechanism of the radiative species SiH*(A 2Δ) formation
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.451038
Reference14 articles.
1. Substitutional doping of amorphous silicon
2. Optical emission spectroscopy: Toward the identification of species in the plasma deposition of hydrogenated amorphous silicon alloys
3. Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon
4. Emission spectra of SiH(A 2Δ→X 2Π) and SiCl2(Ã 1B1→X̃ 1A1) in the VUV photolyses of silane and chlorinated silanes
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