Author:
Shindo M,Ueda Y,Kawakami S,Ishii N,Kawai Y
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference15 articles.
1. CFX(X=1–3)Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition
2. Effect of hydrogen addition to fluorocarbon gases (CF4, C4F8) in selective SiO2/Si etching by electron cyclotron resonance plasma
3. Diagnostics of microwave plasma by laser induced fluorescence
4. Den S, Kuno T, Miyata K, Ito M, Mori M, Goto T, Hayashi Y, Sakumoto Y, Proceedings of the 13th Symp. Plasma Processing 1996, p. 407.
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