Characterization of electron and negative ion densities in fluorocarbon containing inductively driven plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1410896
Reference23 articles.
1. Measurement of negative-ion density in high-density C4F8 plasma using a laser photodetachment technique combined with a millimeter-wave open resonator
2. Photodetachment Study of Capacitively-Coupled RF C4F8Plasma
3. Measurements of negative ion density in fluorocarbon ECR plasma
4. Determination of negative-ion density in an electron cyclotron resonance C4F8 plasma
5. Photodetachment diagnostic techniques for measuring negative ion densities and temperatures in plasmas
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1. A sheath correction method for electron density measurements with the microwave resonant curling probe;Plasma Sources Science and Technology;2023-09-01
2. Plasma kinetics of c-C4F8 inductively coupled plasma revisited;Journal of Vacuum Science & Technology B;2022-03
3. Foundations of measurement of electrons, ions and species fluxes toward surfaces in low-temperature plasmas;Plasma Sources Science and Technology;2021-03-01
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