Strain-induced Ge segregation on Si at high temperatures
Author:
Funder
Russian Science Foundation
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference50 articles.
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3. Instability of two-dimensional layers in the Stranski-Krastanov growth mode of Ge on Si(111);Shklyaev;Phys. Rev. B,1998
4. Growth of Ge–Si(111) epitaxial layers: intermixing, strain relaxation and island formation;Motta;Surf. Sci.,1998
5. Ge islands on Si(111) at coverages near the transition from two-dimensional to three-dimensional growth;Shklyaev;Surf. Sci.,1998
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