High growth rate magnetron sputter epitaxy of GaN using a solid Ga target-Reference-Cited by-同舟云学术

High growth rate magnetron sputter epitaxy of GaN using a solid Ga target

Published:2024-02 Issue: Volume:220 Page:112852
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Pingen Katrin^ORCID,Hinz Alexander M.^ORCID,Sandström Per^ORCID,Wolff Niklas^ORCID,Kienle Lorenz,Scipioni Larry,Greer James,von Hauff Elizabeth,Hultman Lars,Birch Jens,Hsiao Ching-Lien^ORCID

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference45 articles.

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