III-Nitride Magnetron Sputter Epitaxy on Si: Controlling Morphology, Crystal Quality, and Polarity Using Al Seed Layers

Author:

Pingen Katrin12ORCID,Wolff Niklas34,Mohammadian Zahra5,Sandström Per5,Beuer Susanne6,von Hauff Elizabeth12,Kienle Lorenz34,Hultman Lars5,Birch Jens5ORCID,Hsiao Ching-Lien5ORCID,Hinz Alexander M.12ORCID

Affiliation:

1. Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology, Winterbergstrasse 28, D-01277 Dresden, Germany

2. Institute of Solid State Electronics, Technische Universität Dresden, Mommsenstrasse 15, D-01069 Dresden, Germany

3. Synthesis and Real Structure, Department of Material Science, Kiel University, Kaiserstrasse 2, D-24143 Kiel, Germany

4. Kiel Nano, Surface and Interface Science, Kiel University, Christian-Albrechts-Platz 4, D-24118 Kiel, Germany

5. Department of Physics, Chemistry and Biology, Linköpings Universitet, SE-581 83 Linköping, Sweden

6. Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, D-91058 Erlangen, Germany

Funder

Bundesministerium f?r Bildung und Forschung

Vetenskapsr?det

Energimyndigheten

Link?pings Universitet

Deutsche Forschungsgemeinschaft

Fraunhofer-Gesellschaft

Olle Engkvists Stiftelse

Publisher

American Chemical Society (ACS)

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