Author:
Hooda Manish Kumar,Wadhwa Manoj,Verma Sanjay,Nayak M.M.,George P.J.,Paul A.K.
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference14 articles.
1. Plasma etch models based on different plasma chemistry for micro-electro-mechanical-systems application;Paul;Vacuum,2003
2. Fabrication of high aspect ratio structures using chlorine gas chopping technique;Paul;Microelectronic Eng,1997
3. Proceedings of the 8th International Conference on Solid State Sensors and Actuators and Eurosensors IX;Klaassen,1995
4. Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher
5. Marty F. et al: European Micro and nanosystem conf. EMN, 04 oct 2004. pp 25–28.
Cited by
18 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献