Studies of co-implanted helium and hydrogen with an intermediate annealing step for thermal splitting of bonded silicon to oxide-coated wafers
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference20 articles.
1. Silicon on insulator material technology
2. A “smarter-cut” approach to low temperature silicon layer transfer
3. Ultrathin single-crystalline silicon on quartz (SOQ) by 150 °C wafer bonding
4. GaAs on Si: towards a low-temperature “smart-cut” technology
5. Ruddell FH, Bain MF, Suder S, Hurley RE, Armstrong BM, Fusco VF, Gamble HS. Electrochemical Society Proceedings, Vol. 2003–05, Silicon on Insulator Technology & Devices XI, pp. 57–62.
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Solid-phase epitaxial regrowth of amorphous silicon containing helium bubbles;Journal of Applied Physics;2008-11
2. The interaction of cavities in silicon with moving amorphous–crystalline interfaces;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2007-04
3. Ion implantation of hydrogen and helium into silicon wafers for layer transfer in devices;Vacuum;2005-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3