Influence of NH 3 annealing on the chemical states of HfO 2 /Al 2 O 3 stacks studied by X-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Influence of NH 3 annealing on the chemical states of HfO 2 /Al 2 O 3 stacks studied by X-ray photoelectron spectroscopy

Published:2016-02 Issue: Volume:124 Page:60-64
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Liu Jian-Shuang,Lu Hong-Liang,Xu Sai-Sheng,Wang Peng-Fei,Ding Shi-Jin,Zhang David Wei

Funder

National Natural Science Foundation of China

SRFDP

Shanghai Municipal Education Commission

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference28 articles.

1. Effects and mechanisms of nitrogen incorporation into hafnium oxide by plasma immersion implantation

2. Spectroscopic ellipsometry characterization of nitrogen-incorporated HfO2 gate dielectrics grown by radio-frequency reactive sputtering

3. Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma

4. Effect of annealing on the composition and structure of HfO2 and nitrogen-incorporated HfO2

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. XPS study of the nitridation of hafnia on silicon;Applied Surface Science;2024-12

2. Xps Study of the Nitridation of Hafnia on Silicon;2024

3. The electronics transport mechanism of grain and grain boundary in semiconductive hafnium oxynitride thin film;Journal of Materials Science;2019-12-02

4. Stress induced degradation and reliability of Al 2 O 3 thin film on silicon;Vacuum;2018-06

5. Properties of hafnium-aluminum-zinc-oxide thin films for the application of oxide-transistors;Thin Solid Films;2016-12

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3