Optimization of PECVD silicon oxynitride films for anti-reflection coating
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference18 articles.
1. Silicon nitride film growth for advanced gate dielectric at low temperature employing high-density and low-energy ion bombardment
2. Surface passivation of silicon by rf magnetron-sputtered silicon nitride films
3. Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering
4. Refractive index of sputtered silicon oxynitride layers for antireflection coating
5. XPS and AFM study of chemical mechanical polishing of silicon nitride
Cited by 33 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition;Journal of Vacuum Science & Technology A;2023-08-23
2. Low‐Temperature Synthesis of Silicon Oxynitride‐Doped Si for Tunable Bragg Gratings Homogeneously Deposited on Si, SiO2, and Borosilicate Substrates and the tip of SM and PM Optical Fibers;Advanced Optical Materials;2023-04-04
3. Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition;Physical Chemistry Chemical Physics;2022
4. Optimization of Fabrication Process for SiON/SiOx Films Applicable as Optical Waveguides;Coatings;2021-05-15
5. Nanoindentation Hardness and Practical Scratch Resistance in Mechanically Tunable Anti-Reflection Coatings;Coatings;2021-02-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3