Low‐Temperature Synthesis of Silicon Oxynitride‐Doped Si for Tunable Bragg Gratings Homogeneously Deposited on Si, SiO2, and Borosilicate Substrates and the tip of SM and PM Optical Fibers

Abstract

AbstractOptical tunability and repeatability are essential in fabricating optoelectronic devices from waveguides to Bragg gratings (BGs) for high‐energy, high‐power, mode‐locking, and sensing applications. For this purpose, a controlled adjustment in the optical properties, including the refractive index of the deposited nanolayers, becomes critical. This study reveals that silicon oxynitride (SiON) doping into silicon (Si) offers a new way for the preparation of novel Si‐based devices with an emphasis on the BGs for filtering a particular portion of an electromagnetic spectrum, including the wavelengths of 800, 976, 1550, and 1840 nm. Control on the incident angle dependence of the BGs is demonstrated at Watt‐level for the wavelength of 976 nm. Amorphous SiON‐doped Si layers on alternating SiO2 can be synthesized on bulk substrates and different optical fibers at relatively low temperatures with wide and narrow bandwidths. The high reflectivity of the novel Si‐based BGs reveals over −22 dB reflection using typical optical fibers, including standardsingle‐mode fibers and high‐birefringent polarization‐maintaining (PM) fibers. The polarized transmission measurement over the BG on the PMfiber shows the BGs do not deteriorate the PM properties, strongly yielding a beat length of 1.68 mm and birefringence of 9.2 × 10−4 at the telecom C band.