Ion beam effects in SiOx (x<2) subjected to low energy Ar+, He+ and N2+ bombardment
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference42 articles.
1. Optical and structural properties of low-temperature PECVD ETMS SiOx thin films
2. Physical and optical properties of an antireflective layer based on SiOxNy
3. Investigation of silicon oxide films prepared by room-temperature ion plating
4. Fabrication and characterisation of thin low-temperature MBE-compatible silicon oxides of different stoichiometry
5. Mechanism of low temperature nitridation of silicon oxide layers by nitrogen plasma generated by low energy electron impact
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