Selective Area Masked Growth (Nano to Micro)
Author:
Publisher
Elsevier
Reference149 articles.
1. Selective area growth for opto-electronic integrated circuits (OEICs);Davies;Materials Science and Engineering: B,1991
2. Selective Area Epitaxy on Structures and Surfaces, Invited Encyclopedia Article, in Encyclopedia of Materials;Yi,2001
3. Metalorganic chemical vapor deposition for optoelectronic devices;Coleman;Proc IEEE,1997
4. The use of chloride based precursors in metalorganic vapor-phase epitaxy;Kuech;J Cryst Growth,1991
5. Selective epitaxy in the conventional metalorganic vapor phase epitaxy of GaAs;Kuech;Appl Phys Lett,1989
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Investigating Emission Wavelength Control in InAs Quantum Dots for 1.55 μm Telecommunications Applications;Information Systems Engineering and Management;2024
2. Surface Nanostructuring during Selective Area Epitaxy of Heterostructures with InGaAs QWs in the Ultra-Wide Windows;Nanomaterials;2020-12-23
3. Growth Uniformity in Selective Area Epitaxy of AlGaN/GaN Heterostructures for the Application in Semiconductor Devices;Electronics;2020-12-12
4. Mask-free three-dimensional epitaxial growth of III-nitrides;Journal of Materials Science;2020-10-01
5. Special Growth Techniques;Graduate Texts in Physics;2020
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3