Small-angle X-ray scattering studies of a-Si:C:H-Reference-Cited by-同舟云学术

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Small-angle X-ray scattering studies of a-Si:C:H

Published:1995-10 Issue:3 Volume:190 Page:276-282
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Rigden J.S.,Algar C.D.,Newport R.J.,North A.N.,Ibrahim F.,Wilson J.I.B.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. High spatial resolution photo-oxidation of a-Si:C at low temperatures H films

2. Photo-oxidation of amorphous silicon-carbon alloys and its use in field effect transistors

3. Photo-oxidation of a-Si : C : H films

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The influence of “starving plasma” regime on carbon content and bonds in a-Si1−xCx:H thin films;Journal of Applied Physics;1998-09

2. Photo-oxidation of a-Si:C:H studied by in situ XPS;Journal of Non-Crystalline Solids;1995-11

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