The effect of hydrogen dilution on the interatomic bonding of amorphous hydrogenated silicon: carbon-Reference-Cited by-同舟云学术

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The effect of hydrogen dilution on the interatomic bonding of amorphous hydrogenated silicon: carbon

Published:1994-03 Issue:1-2 Volume:169 Page:54-63
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Honeybone P.J.R.,Walters J.K.,Huxley D.W.,Newport R.J.,Howells W.S.,Tomkinson J.,Hotham C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference43 articles.

1. Effect of hydrocarbon gas on the properties of magnetron sputtering of amorphous SiC:H

2. The characteristics of amorphous silicon carbide hydrogen alloy

3. Highly photosensitive magnetron-sputtered amorphous SiC:H doped with Al

4. Photo-oxidation of amorphous silicon-carbon alloys and its use in field effect transistors

5. Evidence for graphitic‐type bonding in glow discharge hydrogenated amorphous silicon carbon alloys

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Rigidity Percolation in Plasma Enhanced Chemical Vapor Deposited a-SiC:H Thin Films;ECS Transactions;2010-10-01

2. Wide band-gap silicon-carbon alloys deposited by very high frequency plasma enhanced chemical vapor deposition;Journal of Applied Physics;2004-10

3. Wannier function analysis of tetrahedral amorphous networks;Diamond and Related Materials;2003-10

4. Oxidation study of plasma-enhanced chemical vapor deposited and rf sputtered hydrogenated amorphous silicon carbide films;Journal of Applied Physics;2001

5. Pulsed and continuous wave plasma deposition of amorphous, hydrogenated silicon carbide from SiH4/CH4 plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1999-09

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