Oxidation study of plasma-enhanced chemical vapor deposited and rf sputtered hydrogenated amorphous silicon carbide films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Reference33 articles.
1. W. K. Choi,Silicon-based Materials and Devices, edited by S. H. Nalwa (Academic, New York) (to be published).
2. SiC synthesis by a plasma deposition process
3. Electrochemical Test to Evaluate Passivation Layers: Overcoats of Si in Ink
4. Amorphous silicon carbide coatings for extreme ultraviolet optics
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