Wide band-gap silicon-carbon alloys deposited by very high frequency plasma enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1786679
Reference78 articles.
1. Hydrogenated Amorphous Silicon Based Alloy: a-Si1-xCx:H
2. Optoelectronic properties, structure and composition of a-SiC:H films grown in undiluted and H2 diluted silane-methane plasma
3. Physics of Amorphous Silicon–Carbon Alloys
4. Photoluminescent, wide-bandgap a-SiC:H alloy films deposited by Cat-CVD using acetylene
5. Luminescence of a-Si:C:H alloys deposited with hydrogen dilution
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