Impact of doping and silicon substrate resistivity on the blistering of atomic-layer-deposited aluminium oxide-Reference-Cited by-同舟云学术

Impact of doping and silicon substrate resistivity on the blistering of atomic-layer-deposited aluminium oxide

Published:2020-08 Issue: Volume:522 Page:146400
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Ott Jennifer,Pasanen Toni P.,Gädda Akiko,Garín Moisés,Rosta Kawa,Vähänissi Ville,Savin Hele

Funder

Aalto University

Academy of Finland

Finnish Academy of Science and Letters

Jenny and Antti Wihuri Foundation

Walter Ahlström Foundation

Ministry of Economy and Competitiveness

European Regional Development Fund

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference32 articles.

1. Atomic layer deposition: an overview;George;Chem. Rev.,2010

2. Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells;Dingemans;J. Vac. Sci. Technol. A,2012

3. Near-unity quantum efficiency of broadband black silicon photodiodes with an induced junction;Juntunen;Nat. Photon.,2016

4. Processing of n+/p-/p+ strip detectors with atomic layer deposition (ALD) grown Al2O3 field insulator on magnetic Czochralski silicon (MCz-Si) substrates;Härkönen;Nucl. Instrum. Methods Phys. Res. A,2016

5. Processing of AC-coupled n-in-p pixel detectors on MCz silicon using atomic layer deposited aluminium oxide;Ott;Nucl. Instrum. Methods Phys. Res. A,2019

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