Dependence of optical properties on composition of silicon carbonitride thin films deposited at low temperature by PECVD
Author:
Funder
Fundação para a Ciência e a Tecnologia
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference32 articles.
1. Influence of the PVD sputtering method on structural characteristics of SiCN-coatings — Comparison of RF, DC and HiPIMS sputtering and target configurations
2. Thin silicon carbonitride films are perspective low-k materials
3. Silicon carbon nitride films as passivation and antireflective coatings for silicon solar cells
4. Hole trapping characteristics of silicon carbonitride (SiCN)-based charge trapping memories evaluated by the constant-current carrier injection method
5. Wide variations of SiCxNy:H thin films optical constants deposited by H2/N2/Ar/hexamethyldisilazane microwave plasma
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1. Effect of plasma power on growth process, chemical structure, and properties of PECVD films produced from hexamethyldisilane and ammonia;Surface and Coatings Technology;2024-08
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