Wide variations of SiCxNy:H thin films optical constants deposited by H2/N2/Ar/hexamethyldisilazane microwave plasma-Reference-Cited by-同舟云学术

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Wide variations of SiCxNy:H thin films optical constants deposited by H2/N2/Ar/hexamethyldisilazane microwave plasma

Published:2012-09 Issue: Volume:208 Page:46-50
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Bulou Simon,Le Brizoual Laurent,Miska Patrice,de Poucques Ludovic,Bougdira Jamal,Belmahi Mohammed

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference36 articles.

1. Reactive magnetron sputtering of Si–C–N films with controlled mechanical and optical properties

2. Characteristics of Si$z.sbnd;C$z.sbnd;N films deposited by microwave plasma CVD on Si wafers with various buffer layer materials

3. Silicon Carbonitride Films by Remote Hydrogen-Nitrogen Plasma CVD from a Tetramethyldisilazane Source

4. Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

5. Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

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1. Dual low pressure plasma process for SiCN:H thin films deposition: A comparative study;Vacuum;2024-01

2. 1,4-Bis(trimethylsilyl)piperazine—Thermal Properties and Application as CVD Precursor;Coatings;2023-06-05

3. A Comparative Study of a:SiCN:H Thin Films Fabricated with Acetylene and Methane;ECS Journal of Solid State Science and Technology;2023-01-01

4. Organosilicon compounds as single-source precursors for SiCN films production;Journal of Organometallic Chemistry;2022-01

5. Dependence of optical properties on composition of silicon carbonitride thin films deposited at low temperature by PECVD;Journal of Non-Crystalline Solids;2021-01

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