Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings-Reference-Cited by-同舟云学术

Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

Published:2007 Issue:1 Volume:105 Page:122-129
ISSN:0021-8995
Container-title:Journal of Applied Polymer Science
language:en
Short-container-title:J. Appl. Polym. Sci.

Author:

Wrobel A. M.,Blaszczyk-Lezak I.,Walkiewicz-Pietrzykowska A.

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry

Reference52 articles.

1. High power deposition and analytics of amorphous silicon carbide films

2. Ion-assisted deposition of CN and SiCN films

3. Characterization of amorphous SiC:H films deposited from hexamethyldisilazane

4. Mechanical and fracture toughness studies of amorphous SiC–N hard coatings using nanoindentation

5. Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings

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