Hard silicon carbonitride thin‐film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology
Author:
Affiliation:
1. Centre of Molecular and Macromolecular Studies Polish Academy of Sciences Lodz Poland
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202000240
Reference58 articles.
1. A covalent micro/nano-composite resistant to high-temperature oxidation
2. Silicon carbonitride: a rival to cubic boron nitride
3. Silicon carbonitride, a new hard material and its relation to the confusion about ‘harder than diamond’ C3N4
4. Stability of Silicon Carbonitride Phases
5. Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
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