Hard silicon carbonitride thin‐film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology-Reference-Cited by-同舟云学术

Hard silicon carbonitride thin‐film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology

Published:2021-02-15 Issue:5 Volume:18 Page:2000240
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Wrobel Aleksander M.¹^ORCID,Uznanski Pawel¹^ORCID

Affiliation:

1. Centre of Molecular and Macromolecular Studies Polish Academy of Sciences Lodz Poland

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.202000240

Reference58 articles.

1. A covalent micro/nano-composite resistant to high-temperature oxidation

2. Silicon carbonitride: a rival to cubic boron nitride

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4. Stability of Silicon Carbonitride Phases

5. Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide

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