Dependence of chemical composition and bonding of amorphous SiC on deposition temperature and the choice of substrate
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference36 articles.
1. Wear-resistant amorphous SiC coatings produced by plasma-enhanced CVD
2. Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films
3. Dielectric/metal sidewall diffusion barrier for Cu/porous ultralow-k interconnect technology
4. Double amorphous silicon-carbide p-layer structures producing highly stabilized pin-type protocrystalline silicon multilayer solar cells
5. Plasma assisted chemical vapor deposition on ‘‘three‐dimensional’’ substrates
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