Cesium/xenon co-sputtering at different energies during ToF-SIMS depth profiling
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference48 articles.
1. Secondary-ion emission probability in sputtering
2. Work-Function Dependence of Negative-Ion Production during Sputtering
3. Velocity Dependence of the Ionization Probability of Sputtered Atoms
4. Effect of surface chemistry and work function in secondary ion mass spectrometry
5. Anomalous coverage dependence of secondary-ion emission from overlayers
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2. ToF-SIMS Depth Profiling of Metal, Metal Oxide, and Alloy Multilayers in Atmospheres of H2, C2H2, CO, and O2;Journal of the American Society for Mass Spectrometry;2021-12-22
3. Nonlinear effects in low-energy ion sputtering of solids;Journal of Vacuum Science & Technology A;2020-09
4. Application of a novel compact Cs evaporator prototype for enhancing negative ion yields during FIB-TOF-SIMS analysis in high vacuum;Ultramicroscopy;2019-01
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