Author:
Veerapandian S.K.P.,Beuer S.,Rumler M.,Stumpf F.,Thomas K.,Pillatsch L.,Michler J.,Frey L.,Rommel M.
Subject
Instrumentation,Nuclear and High Energy Physics
Reference16 articles.
1. A review of focused ion beam applications in microsystem technology;Reyntjens;J. Micromech. Microeng.,2001
2. Accurate parameter extraction for the simulation of direct structuring by ion beams;Beuer;Microelectron. Eng.,2007
3. Nanoscale effects in focused ion beam processing;Frey;Appl. Phys. A Mater. Sci. Process.,2003
4. Focused ion beam induced deposition and ion milling as a function of angle of ion incidence;Xu;J. Vac. Sci. Technol. B Microelectron. Nanometer Struct.,1992
5. D. Santamore, K. Edinger, J. Orloff, J. Melngailis, Focused ion beam sputter yield change as a function of scan speed, J. Vac. Sci. Technol. B Microelectron. Nanometer. Struct., 15(6) (1997), 2346–2349.
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