Focused ion beam sputter yield change as a function of scan speed-Reference-Cited by-同舟云学术

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Focused ion beam sputter yield change as a function of scan speed

Published:1997-11 Issue:6 Volume:15 Page:2346
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Santamore D.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 55 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent advances in focused ion beam nanofabrication for nanostructures and devices: fundamentals and applications;Nanoscale;2021

2. Simulation of Secondary Ion Position on the Detector for Three-dimensional Shave-off Method;e-Journal of Surface Science and Nanotechnology;2020-04-02

3. Ion irradiation of III–V semiconductor surfaces: From self-assembled nanostructures to plasmonic crystals;Applied Physics Reviews;2019-12

4. Molecular dynamic simulation of orientation-dependent effect on silicon crystalline during sputtering process of focused ion beam;Microsystem Technologies;2018-09-25

5. Influence of the Shave-off Scan Speed on the Cross-Sectional Shape;e-Journal of Surface Science and Nanotechnology;2018-05-31

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