Laser reactive ablation deposition of TiC films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference15 articles.
1. Laser Processing of Thin Films and Microstructures;Boyd,1987
2. Deposition of SiO2 by reactive excimer laser ablation from a SiO target
3. Reactive pulsed laser deposition of thin TiN films
4. Excimer laser reactive ablation: An efficient approach for the deposition of high quality TiN films
5. Deposition of high quality TiN films by excimer laser ablation in reactive gas
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1. Formation of Titanium Nitride, Titanium Carbide, and Silicon Carbide Surfaces by High Power Femtosecond Laser Treatment;ChemPlusChem;2021-05-07
2. Synthesis of nanostructured multiphase Ti(C,N)/a-C films by a plasma focus device;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2010-09
3. Growth of titanium oxynitride layers by short pulsed Nd:YAG laser treatment of Ti plates: Influence of the cumulated laser fluence;Applied Surface Science;2009-03
4. Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablation of titanium in low-pressure CH4and C2H2atmospheres;The European Physical Journal Applied Physics;2004-08-25
5. Spectroscopic characterization of TiCx films produced by pulsed laser deposition in CH4 environments;Applied Surface Science;2004-05
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