Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablation of titanium in low-pressure CH4and C2H2atmospheres
Author:
Publisher
EDP Sciences
Subject
Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://epjap.epj.org/10.1051/epjap:2004174/pdf
Reference18 articles.
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4. Reactive pulsed laser deposition of thin TiN films
5. Deposition of high quality TiN films by excimer laser ablation in reactive gas
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