Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3–Ar–H2 plasma treatment for capacitor electrodes
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
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2. Low-Resistivity Titanium Nitride Thin Films Fabricated by Atomic Layer Deposition with TiCl4 and Metal–Organic Precursors in Horizontal Vias;ACS Applied Electronic Materials;2023-07-18
3. A Study on the Effect of Base‐Reactant in Low‐Temperature Atomic Layer Deposition of Zinc Oxide;physica status solidi (a);2021-10-14
4. Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications;ACS Applied Electronic Materials;2021-02-05
5. Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride;AIP Advances;2021-01-01
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