Enhanced electrical properties of Hf-aluminate thin films by crystal structure modulation
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference13 articles.
1. Characterization of Inversion-Layer Capacitance of Electrons in High- $k$/Metal Gate Stacks
2. Internal photoemission at interfaces of high-κ insulators with semiconductors and metals
3. Crystallized HfLaO embedded tetragonal ZrO2 for dynamic random access memory capacitor dielectrics
4. Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors
5. Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors
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