Internal photoemission at interfaces of high-κ insulators with semiconductors and metals
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2799091
Reference132 articles.
1. Hafnium and zirconium silicates for advanced gate dielectrics
2. High-? Gate Dielectrics
3. High Dielectric Constant Materials
4. Photoemissive Determination of Barrier Shape in Tunnel Junctions
5. Hot-Electron Attenuation in ThinAl2O3Films
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