Effects of SiC buffer layer growth temperature on the residual strain of GaN/SiC/Si thin films
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference14 articles.
1. Growth of GaN on SiC/Si substrates using AlN buffer layer by hot-mesh CVD
2. Growth and characterization of crack-free semipolar {1-101}InGaN∕GaN multiple-quantum well on V-grooved (001)Si substrates
3. Growth of free-standing GaN layer on Si(111) substrate
4. AlGaN/GaN high electron mobility transistors grown on 3C-SiC/Si(111)
5. Calculation of residual thermal stress in GaN epitaxial layers grown on technologically important substrates
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1. Growth Mechanism of Exfoliable GaN by van der Waals Epitaxy on Wrinkled Hexagonal Boron Nitride;Crystal Growth & Design;2023-02-27
2. Epitaxial growth optimization of AlGaN/GaN high electron mobility transistor structures on 3C-SiC/Si;Journal of Applied Physics;2019-06-21
3. Employing Al buffer layer with Al droplets-distributed surface to obtain high-quality and stress-free GaN epitaxial films on Si substrates;Journal of Materials Science;2016-10-14
4. Effect of SiC-on-Si template residual stress on GaN residual stress and crystal quality;physica status solidi (b);2016-01-12
5. Epitaxy of silicon carbide on silicon: Micromorphological analysis of growth surface evolution;Superlattices and Microstructures;2015-10
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