A method for monitoring the thickness of semiconductor and dielectric thin films: application to the determination of large-area thickness profiles-Reference-Cited by-同舟云学术

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A method for monitoring the thickness of semiconductor and dielectric thin films: application to the determination of large-area thickness profiles

Published:1997-07 Issue:1-2 Volume:303 Page:255-263
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Laaziz Y.,Bennouna A.,Elazhari M.Y.,Ramiro-Bargueño J.,Outzourhit A.,Chahboun N.,Ameziane E.L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Thin film thickness measurement: A comparison of various techniques

2. A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film

3. Determination of surface roughness and optical constants of inhomogeneous amorphous silicon films

4. On some important care to take when making spectrophotometric measurements on semiconductor thin films

5. The influence of thickness and index inhomogeneities on the transmission of semiconductor thin films

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2. Analysis of intraoperative microscopy imaging techniques and their future applications;Frontiers in Physics;2022-10-10

3. Thickness and birefringence of thin films assessed by interferometry using a low-cost spectrometer;Spectroscopy Letters;2021-10-21

4. Measurement of opaque film's surface profile by broadband-light interference methods;SPIE Proceedings;2005-02-14

5. Determination of thickness, refractive index, and thickness irregularity for semiconductor thin films from transmission spectra;Applied Optics;2002-01-01

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