Synthesis of amorphous silicon carbonitride films by pulsed laser deposition-Reference-Cited by-同舟云学术

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Synthesis of amorphous silicon carbonitride films by pulsed laser deposition

Published:2002-01 Issue:1-2 Volume:402 Page:99-110
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Boughaba S,Sproule G.I,McCaffrey J.P,Islam M,Graham M.J

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference54 articles.

1. Oxidation and Corrosion of Silicon-Based Ceramics and Composites*

2. Silicon Nitride and Related Materials

3. High-Temperature Properties of Si3N4 Ceramics

4. Unique Microstructural Development in SiC Materials with High Fracture Toughness

5. Optimization of Mechanical Properties in SiC Control of the Microstructure

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1. Amorphous silicon carbonitride (a‐SiCN) thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of substrate temperature;Plasma Processes and Polymers;2022-12-27

2. Amorphous silicon carbonitride a‐SiCN thin film coatings by remote plasma chemical vapor deposition using organosilicon precursor: Effect of plasma composition;Plasma Processes and Polymers;2022-11-29

3. High-Temperature Corrosion-Resistant Ceramic Composite Materials Based on (Si–B–C–N) System Compounds (Review);Inorganic Materials: Applied Research;2022-09-30

4. Organosilicon compounds as single-source precursors for SiCN films production;Journal of Organometallic Chemistry;2022-01

5. Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical properties of deposited films;Plasma Processes and Polymers;2021-02-03

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