Precise etch stop for emitter etching of self-aligned heterojunction bipolar transistors
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
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5. Device Damage During Low Temperature High-Density Plasma Chemical Vapor Deposition;Handbook of Advanced Plasma Processing Techniques;2000
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