Characterization of plasma-deposited silicon nitride coating used for integrated circuit encapsulation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. Plasma deposition of inorganic silicon containing films
2. Electrical properties of Si‐N films deposited on silicon from reactive plasma
3. Variation of Hydrogen Bonding, Depth Profiles, and Spin Density in Plasma‐Deposited Silicon Nitride and Oxynitride Film with Deposition Mechanism
4. Properties of Plasma‐Deposited Silicon Nitride
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3. Characteristic Study of Silicon Nitride Films Deposited by LPCVD and PECVD;Silicon;2018-04-13
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