Hard amorphous silicon carbonitride coatings produced by plasma enhanced chemical vapour deposition
Author:
Affiliation:
1. Department of Physical Chemistry; Technical University Chemnitz; Chemnitz Germany
Publisher
Wiley
Subject
Metals and Alloys
Reference18 articles.
1. Characterization of amorphous SiC:H films deposited from hexamethyldisilazane
2. Hardness and stiffness of amorphous SiCxNy chemical vapor deposited coatings
3. Deposition chemistry and structure of plasma‐deposited silicon nitride films from 1,1,3,3,5,5‐hexamethylcyclotrisilazane
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