The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption-Reference-Cited by-同舟云学术

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The interaction of chlorine with Si(100)2 × 1 studied using soft X-ray photoemission and photon stimulated ion desorption

Published:1994-04 Issue: Volume:307-309 Page:269-273
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Sterratt D.,Greenwood C.L.,Williams E.M.,Muryn C.A.,Wincott P.L.,Thornton G.,Román E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference21 articles.

1. Surface science aspects of etching reactions

2. Si(100)2×1-Cl structure from x-ray-absorption spectroscopy

3. ESDIAD studies of fluorine and chlorine adsorption at Si(100)

4. Transformation of Cl bonding structures on Si(100)-(2×1)

5. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chapter 2 Epitaxial growth theory: Vapor-phase and surface chemistry;Semiconductors and Semimetals;2001

2. Nickel-induced defects and their role in governing chlorine chemistry on the Si(100) surface;Surface Science;1997-12

3. Desorption and diffusion at pulsed-laser-melted surfaces: The case of chlorine on silicon;Physical Review B;1997-05-15

4. Adsorption and desorption processes of Cl on a Si(100) surface;Surface Science;1996-08

5. Surface structure and doping-induced etching of Si(100) by chlorine: First-principles study;Physical Review B;1996-07-15

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