ESDIAD studies of fluorine and chlorine adsorption at Si(100)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference22 articles.
1. Synchrotron photoemission investigation of the initial stages of fluorine attack on Si surfaces: Relative abundance of fluorosilyl species
2. Chlorine adsorption on Si(111) × 7 and GaAs(110)1 × 1: New photoemission results
3. Electronic properties and bonding sites for chlorine chemisorption on Si(111)-(7×7)
4. Chlorine chemisorption on silicon and germanium surfaces: Photoemission polarization effects with synchrotron radiation
5. Low-energy electron energy loss spectroscopy of Cl adsorbed Si(111), Si(100) and Si(110) surfaces
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2. Chemistry on Silicon Surfaces;PATAI'S Chemistry of Functional Groups;2009-12-15
3. Secondary ion emission from a water and fluorine adsorbed Si( 100 ) surface irradiated with electrons and highly charged ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-05
4. First-principles molecular-dynamics calculations and STM observations of dissociative adsorption of Cl2 and F2 on Si(001) surface;Surface Science;2002-09
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