Atomic layer deposition of strontium titanate films from Sr(iPr3Cp)2, Ti[N(CH3)2]4 and H2O-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Atomic layer deposition of strontium titanate films from Sr(iPr3Cp)2, Ti[N(CH3)2]4 and H2O

Published:2014-01 Issue: Volume:550 Page:53-58
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Rentrop S.,Moebus T.,Abendroth B.,Strohmeyer R.,Schmid A.,Weling T.,Hanzig J.,Hanzig F.,Stöcker H.,Meyer D.C.

Funder

European Union Regional Development Funds

Ministry of Science and Art of Saxony (SMWK)

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference58 articles.

1. Atomic layer deposition of TiO 2 from tetrakis(dimethylamino)titanium and H 2 O

2. Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications

3. Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors

4. NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors

5. Optical Properties of NiO Thin Films: A Potential Material for Optoelectronic Devices

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nm;Applied Surface Science;2024-08

2. Toward Advanced High‐ k and Electrode Thin Films for DRAM Capacitors via Atomic Layer Deposition;Advanced Materials Technologies;2022-10-26

3. Influence of nanometric microstructural development on thermophysical properties of lanthanum-doped strontium titanate;Materials Chemistry and Physics;2021-09

4. In situ ellipsometry monitoring of TiO2 atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H2O precursors on Si and In0.53Ga0.47As substrates;Thin Solid Films;2021-04

5. Atomic layer deposited strontium niobate thin films as new high-k dielectrics;Materials Letters;2021-03

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3