NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors-Reference-Cited by-同舟云学术

NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)2 and Ozone as Precursors

Published:2012-03 Issue:1-3 Volume:18 Page:61-69
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Antony Premkumar Peter,Toeller Michael,Adelmann Christoph,Meersschaut Johan,Franquet Alexis,Richard Olivier,Tielens Hilde,Brijs Bert,Moussa Alain,Conard Thierry,Bender Hugo,Schaekers Marc,Kittl Jorge A.,Jurczak Malgorzata,Van Elshocht Sven

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201106949/fullpdf

Reference57 articles.

1. Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

2. Synthesis and characterization of nanostructured nickel oxide thin films prepared with chemical spray pyrolysis

3. Efficient electrochromic nickel oxide thin films by electrodeposition

4. MOCVD Template Approach to the Fabrication of Free-Standing Nickel(II) Oxide Nanotube Arrays: Structural, Morphological, and Optical Properties Characterization

5. Nanoscale formation mechanism of conducting filaments in NiO thin films

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