Atomic layer deposition of TiO 2 from tetrakis(dimethylamino)titanium and H 2 O-Reference-Cited by-同舟云学术

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Atomic layer deposition of TiO 2 from tetrakis(dimethylamino)titanium and H 2 O

Published:2013-10 Issue: Volume:545 Page:176-182
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Abendroth Barbara,Moebus Theresa,Rentrop Solveig,Strohmeyer Ralph,Vinnichenko Mykola,Weling Tobias,Stöcker Hartmut,Meyer Dirk C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition

2. The influence of crystallinity on the resistive switching behavior of TiO2

3. Growth of titanium dioxide thin films by atomic layer epitaxy

4. Atomic Layer Deposition of SiO2 and TiO2 in Alumina Tubular Membranes: Pore Reduction and Effect of Surface Species on Gas Transport

5. A comparative study of the electrical properties of TiO2films grown by high-pressure reactive sputtering and atomic layer deposition

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1. Synthesis of titanium dioxide thin films via thermo- and plasma-enhanced atomic layer deposition;Applied Surface Science;2024-11

2. Optical Properties of TiO₂ Grown by Atomic Layer Deposition Using Various Oxidizing Agents: The Ellipsometry Analysis of Absorption Properties;Advanced Materials Interfaces;2024-07-12

3. Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing;Atomic Layer Deposition;2024-06-04

4. Direct characterization of interface sites in Au/TiO2 catalysts prepared using atomic layer deposition;Chem Catalysis;2024-05

5. Dependence of the Metal–Insulator–Semiconductor Schottky Barrier Height on Insulator Composition;ACS Applied Electronic Materials;2024-01-18

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