In situ ellipsometry monitoring of TiO2 atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H2O precursors on Si and In0.53Ga0.47As substrates-Reference-Cited by-同舟云学术

In situ ellipsometry monitoring of TiO2 atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H2O precursors on Si and In0.53Ga0.47As substrates

Published:2021-04 Issue: Volume:723 Page:138591
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Skopin E.V.^ORCID,Abdukayumov K.,Abi Younes P.,Anikin M.,Roussel H.^ORCID,Deschanvres J.-L.,Renevier H.

Funder

ANR

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

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