The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance-Reference-Cited by-同舟云学术

The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance

Published:2016-10 Issue: Volume:616 Page:23-26
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Xue Panpan,Pei Dongfei,Zheng Huifeng,Li Weiyi,Afanas'ev Valeri V.,Baklanov Mikhail R.,de Marneffe Jean-Francois,Lin Yi-Hung,Fung Hok-Sum,Chen Cheng-chi,Nishi Yoshio,Shohet J. Leon

Funder

Semiconductor Research Corporation

National Science Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

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