Effects of Kr sputtering on ultrathin PtHfSi film formation
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference29 articles.
1. Advanced model and analysis of series resistance for CMOS scaling into nanometer regime. II. Quantitative analysis
2. High-performance metal/silicide antifuse (for CMOS technology)
3. Thin silicide development for fully-depleted SOI CMOS technology
4. Design analysis of thin-body silicide source/drain devices
5. Revolutional Progress of Silicon Technologies Exhibiting Very High Speed Performance Over a 50-GHz Clock Rate
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Microstructure and adsorption characteristics of Zr–Co–RE getter films deposited using krypton as sputtering gas;AIP Advances;2023-05-01
2. Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process;IEICE Transactions on Electronics;2019-06-01
3. The Effect of Kr/O2 Sputtering on the Ferroelectric Properties of SrBi2Ta2O9 Thin Film Formation;IEICE Transactions on Electronics;2019-06-01
4. PdEr-Silicide Formation and Contact Resistivity Reduction to n-Si(100) Realized by Dopant Segregation Process;IEICE Transactions on Electronics;2018-05-01
5. PdYb-Silicide with Low Schottky Barrier Height to n-Si Formed from Pd/Yb/Si(100) Stacked Structures;IEICE Transactions on Electronics;2017
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3