N-face GaN($000\bar{1}$) films grown by group-III-source flow-rate modulation epitaxy
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/53/i=11S/a=11RC01/pdf
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Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. N-polar III-nitride transistors;III-Nitride Electronic Devices;2019
2. Surface supersaturation in flow-rate modulation epitaxy of GaN;Journal of Crystal Growth;2017-06
3. Improved crystalline quality of N-polar GaN epitaxial layers grown with reformed flow-rate-modulation technology;Japanese Journal of Applied Physics;2016-11-30
4. Surface morphology control of nonpolarm-plane AlN homoepitaxial layers by flow-rate modulation epitaxy;physica status solidi (b);2016-11-28
5. N-face GaN$(000\bar{1})$ films with hillock-free smooth surfaces grown by group-III-source flow-rate modulation epitaxy;Japanese Journal of Applied Physics;2016-02-24
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