Flatband voltage stability and time to failure of MOCVD-grown SiO2 and Si3N4 dielectrics on N-polar GaN
Author:
Funder
Office of Naval Research
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://iopscience.iop.org/article/10.7567/1882-0786/ab4d39/pdf
Reference22 articles.
1. Demonstration of Constant 8 W/mm Power Density at 10, 30, and 94 GHz in State-of-the-Art Millimeter-Wave N-Polar GaN MISHEMTs
2. N-Polar GaN HEMTs Exhibiting Record Breakdown Voltage Over 2000 V and Low Dynamic On-Resistance
3. Insulated gate and surface passivation structures for GaN-based power transistors
4. Electronic surface and dielectric interface states on GaN and AlGaN
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1. High-Voltage (>1.2 kV) AlGaN/GaN Monolithic Bidirectional HEMTs With Low On-Resistance (2.54 mΩ ⋅ cm2);IEEE Transactions on Electron Devices;2024-01
2. On the characteristics of N-polar GaN Schottky barrier contacts with LPCVD SiN interlayers;Applied Physics Letters;2021-03-22
3. A systematic and quantitative analysis of the bulk and interfacial properties of the AlSiO dielectric on N-polar GaN using capacitance–voltage methods;Journal of Applied Physics;2020-08-21
4. Characterization of AlSiO dielectrics with varying silicon composition for N-polar GaN-based devices;Semiconductor Science and Technology;2020-08-11
5. Improved operation stability of in situ AlSiO dielectric grown on (000–1) N-polar GaN by MOCVD;Applied Physics Express;2020-05-28
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