Atomic layer etching by gas cluster ion beams with acetylacetone
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.7567/1347-4065/ab17c5/pdf
Reference30 articles.
1. Overview of atomic layer etching in the semiconductor industry
2. Digital chemical vapor deposition and etching technologies for semiconductor processing
3. Atomic Layer Etching: An Industry Perspective
4. Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
5. Atomic Layer Etching: Rethinking the Art of Etch
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2. Plasma atomic layer etching of molybdenum with surface fluorination;Applied Surface Science;2023-08
3. Atomic layer etching of silicon nitride film by oxygen gas cluster ion beam with acetylacetone;Japanese Journal of Applied Physics;2023-06-01
4. Selectivity in atomically precise etching: Thermal atomic layer etching of a CoFeB alloy and its protection by MgO;Applied Surface Science;2022-02
5. Gas-dynamic sources of cluster ions for solving fundamental and applied problems;Physics-Uspekhi;2021-06
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